Silicon-Surfaces, Nanotechnology, Surface chemistry, Infrared spectroscopy, Angles (Geometry)-Measurement., Contact angle, Dynamic contact angle goniometry, Silicon
Nanopatterning silicon surfaces in terms of both topography and chemistry has been shown to influence microorganism behavior and therefore biofilm attachment pattern. Since biofilm has been found to be problematic in many industries such as medicine and dentistry, this study focuses on expanding our capabilities to alter the chemical patterning of a silicon surface using three methods: surface etching, oxidation, and hydrosilylation. All of surface topography, level of oxidation, and hydrosilylation can be controlled simultaneously to produce silicon surfaces with distinct properties. We especially attempt to provide evidence of site-specific oxidation on rough surfaces that are covered with nanopyramids after anisotropic surface etching. In addition, we explore the possibility of preferential hydrosilylation at SiH over SiO bonds. This study utilizes Fourier Transform Infrared Spectroscopy and Dynamic Contact Angle Goniometry to analyze surface topography and wettability.
Kim, Minhee, "Simultaneously controlling nanoscale morphology and chemical functionality in the Si(100) surface" (2015). Theses, Dissertations, and Projects. 1570.